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Faculty are involved in state-of-the-art research in thin film microelectronics which will be used in the next generation of micro-, opto-, and bio-electronic devices such as VLSI thin film transistors (TFTs) and biochips. The main objectives of the research are to determine the fundamental relationships which relate material properties and their processing conditions to device characteristics and to develop high-performance, highly reliable, manufacturable semiconductor devices for current and future applications. Our research is heavily involved in various types of thin film technologies such as plasma enhanced and non-plasma enhanced chemical vapor deposition, plasma etching, rapid thermal annealing, metallization, crystallization, self-aligned lithography, process integration, etc.
Plasma Technology
Plasma technology presently is divided into two broad areas: (1) low-pressure,
non-equilibrium applications in the microelectronics industry and (2)
ambient pressure sparks, arcs, and contained plasma which have applications
ranging from Electrical Discharge Machining to Plasma Spray Coating to
environmental remediation of both nuclear and municipal waste to energy
conversion as in the thermonuclear fusion plasmas.
